Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1985-05-29
1987-04-28
Demers, Arthur P.
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419214, 20419227, 20419215, 204298, C23C 1400
Patent
active
046612297
ABSTRACT:
Method for producing a reactively sputtered conducting transparent metal oxide film onto a continuous web moving in a sputtering chamber at a distance past a metal target. The target is arranged in combination with a counterelectrode powered such that a sputtering plasma discharge is generated inside the sputtering chamber transferring metal atoms from the target to the moving web. Oxygen is introduced into said chamber containing a low pressure atmosphere of an inert gas to produce a metal oxide coating. During the sputter process the surface resistance of the coating is continuously monitored at least at two areas across the width of the continuously moving web, whereby the sputtering conditions are controlled such that at least one area exhibits an optimum minimum resistance value.
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Thin Solid Films, vol. 96 (1982) pp. 121-127, M. I. Ridge et al.: Composition Control in Conducting Oxide Thin Films.
Hemming David H.
Turner Peter G.
Demers Arthur P.
Koninklijke Emballage Industrie Van Leer B.V.
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