Method and system for predictive MOSFET layout generation...

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design

Reexamination Certificate

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Details

C716S030000, C716S030000, C716S030000, C716S030000

Reexamination Certificate

active

06728942

ABSTRACT:

BACKGROUND OF THE INVENTION
1. Field of the Invention
The present invention is generally in the field of circuit design. More specifically, the present invention is in the field of designing circuits including at least one MOSFET.
2. Background Art
The demand for advanced consumer electronic devices, such as cellular phones and other wireless devices, has challenged semiconductor manufacturers to reduce the time-to-market for the low-power radio frequency integrated circuits (“RFIC”) these products contain. In an effort to meet that challenge, semiconductor manufacturers use automated design systems that provide the designer with sets of tools and methodologies that reduce the entire design cycle of the RFIC.
A typical RFIC design system includes a design cycle that comprises various steps. For example, the steps in an RFIC design cycle can include circuit design and simulation, circuit layout generation, circuit layout verification, and extraction of parasitics from the circuit layout. The initial circuit design and simulation is performed before the designer has knowledge of the exact layout of the entire circuit, which is generated later in the design cycle. As a result, the designer has to attempt to predict and counteract the effect of various parasitics that might be introduced during layout design, which can severely degrade circuit performance.
Timing, voltage levels, and race conditions have to be re-verified after the designer knows of exact parasitics, such as parasitic capacitance, resistance, and inductance, extracted from circuit layout. Thus, a new circuit simulation incorporating correct values of the extracted parasitics from the circuit layout is required. Even then, the new circuit layout will often result in different values of extracted parasitics. Some parasitics may be eliminated, some new ones may be introduced, and some may increase or decrease, as such resulting in the need to redesign and re-simulate the circuit. The above steps are repeated, where the circuit design is modified by re-extracted parasitics from the circuit layout.
Without precise knowledge of the effect circuit modifications have on parasitics extracted from the circuit layout, the designer has to continually attempt to predict what new parasitics might be generated from the latest circuit modifications. Thus, the circuit's design cycle continues through numerous, time consuming iterations until the circuit layout parasitics have been correctly taken into account during the circuit design and simulation cycle. This repetitious cycle can result in many days or weeks of delay in completion of the circuit design for large circuit blocks. The resulting increase in “time-to-market” causes a tremendous economic loss to semiconductor design houses and manufacturers.
FIG. 1
shows flowchart
100
, which illustrates a typical sequence of steps in a circuit's design, layout, and verification. In step
102
in
FIG. 1
, a circuit is designed and a schematic for the circuit is made. The circuit is also simulated in step
102
. The circuit can be designed with the assistance of a commercial circuit design editor, such as Composer®, by Cadence Design Systems®, Inc. For example, a circuit comprising a number of RF MOSFETs can be input in the circuit schematic. As a part of the circuit design and schematic formation, parameters such as “finger width” (“W
F
”), “finger length” (“L
F
”), and “number of fingers” (“N
F
”) can be input in the circuit design editor and into the schematic. Thus, for example, the resulting circuit schematic would comprise symbols corresponding to the RF MOSFET, together with the above-mentioned parameters, i.e. W
F
, L
F
, and N
F
.
A simulation program can simulate the electrical behavior of a circuit using the parameters that were input for the circuit's components. For example, the simulation program can predict the electrical behavior of RF MOSFETs mentioned above using the input parameters W
F
, L
F
, and N
F
. However, the accuracy of the results obtained from the circuit simulation depend on the accuracy of all the circuit components, including a large number of parasitic components, whose values cannot generally be accurately estimated by conventional design techniques. The circuit simulation can be written and performed, for example, by using the SPICE® program.
In step
104
, a circuit layout is generated in a layout generator. For example, the layout generator can interpret the W
F
, L
F
, and N
F
parameters of the RF MOSFETs that were input with the RF MOSFET's symbol in the circuit's schematic in step
102
, and generate an RF MOSFET layout. The layout generator program can be written in SKILL®, C++, a combination of the two languages, or a combination of a number of other languages.
In step
106
in
FIG. 1
, a design rule check (“DRC”) and a layout versus circuit schematic (“LVS”) verification is performed on the circuit layout generated in step
104
. DRC is performed to ensure that the circuit layout conforms to all manufacturing specifications. For example, the DRC program identifies problems such as “minimum-spacing” violations and “minimum-width” violations. In LVS, the circuit layout is checked against the circuit schematic to ensure electrical equivalence. In other words, the circuit layout is checked to see that it corresponds to the circuit schematic. By way of example, the LVS checking can be implemented using the Calibre® program and a rule file written in Calibre® format.
In step
108
, parasitics are extracted from the circuit layout. For example, in an RF MOSFET layout, both the RF MOSFET's “internal” parasitics, and the parasitics generated by the interconnect routing between the RF MOSFET and other circuit components, are extracted. For example, the RF MOSFET's internal parasitics can include, among other things, the capacitance between the RF MOSFET's source and the “bulk” (i.e. the silicon substrate), and the resistance between the RF MOSFET's source and the “bulk.”
It is noted that the RF MOSFET's internal parasitics have a great effect on circuit performance. The internal and interconnect routing parasitics are used by the circuit designer to modify the circuit schematic in step
102
, and the circuit design cycle comprising steps
102
,
104
,
106
, and
108
begins anew. A modified circuit layout is generated in step
104
, and DRC and LVS are performed on the modified circuit layout in step
106
. In step
108
, parasitics are extracted from the modified circuit layout. For example, for the circuit comprising the RF MOSFET discussed above, both the RF MOSFET's “internal” parasitics, and the parasitics generated by the interconnect routing between the RF MOSFET and other circuit components, would again be extracted. Thus, the circuit design cycle comprising steps
102
,
104
,
106
, and
108
as discussed above is repeated until circuit design and simulation step
102
can be performed with a high degree of confidence in the parasitic values that correspond to the circuit layout. As discussed above, the repetitive circuit design cycle significantly increases the time-to-market for integrated circuits such as RFICs.
Therefore, there exists a need for an integrated design system that provides a reduction in the time-to-market for integrated circuits, such as RFICs comprising RF MOSFETs. More specifically, there exists a need for an integrated design system that is able to predict the parasitics that will result from an RF MOSFET layout before the layout is generated, and thereby minimize undesirable repetition of the circuit design cycle.
SUMMARY OF THE INVENTION
The present invention is directed to method and system for predictive MOSFET layout generation with reduced design cycle. The invention provides a reduction in the time-to-market for integrated circuits, such as RFICs comprising RF MOSFETs. More specifically, the invention is an integrated design system that is able to predict the parasitics that will result from an RF MOSFET layout before the layout is generated,

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