Method and system for patterning of magnetic thin films...

Semiconductor device manufacturing: process – Having magnetic or ferroelectric component

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257SE21663, C428S690000

Reexamination Certificate

active

07611911

ABSTRACT:
A method (and resulting structure) of patterning a magnetic thin film, includes using a chemical transformation of a portion of the magnetic thin film to transform the portion to be non-magnetic and electrically insulating.

REFERENCES:
patent: 4411757 (1983-10-01), Kitada et al.
patent: 4536520 (1985-08-01), Mueller
patent: 6024885 (2000-02-01), Pendharkar et al.
patent: 6093659 (2000-07-01), Grider et al.
patent: 6165803 (2000-12-01), Chen et al.
patent: 6168845 (2001-01-01), Fontana et al.
patent: 6174737 (2001-01-01), Durlam et al.
patent: 6296777 (2001-10-01), Engelhardt et al.
patent: 6331364 (2001-12-01), Baglin et al.
patent: 6383597 (2002-05-01), Fullerton et al.
patent: 6383598 (2002-05-01), Fullerton et al.
patent: 6391430 (2002-05-01), Fullerton et al.
patent: 6440520 (2002-08-01), Baglin et al.
patent: 6567299 (2003-05-01), Kunikiyo et al.
patent: 6798004 (2004-09-01), Grynkewich et al.
patent: 6841224 (2005-01-01), Kamata et al.
patent: 6849349 (2005-02-01), Klemmer et al.
patent: 6881351 (2005-04-01), Grynkewich et al.
patent: 2002/0098676 (2002-07-01), Ning et al.
patent: 2002/1014219 (2002-10-01), Kamata et al.
patent: 2003/0113524 (2003-06-01), Klemmer et al.
patent: 2003/0219944 (2003-11-01), Kato et al.
patent: 2003/0224608 (2003-12-01), Lee et al.
patent: 2004/0205958 (2004-10-01), Grynkewich et al.
patent: 2005/0002229 (2005-01-01), Matsutera et al.
patent: 2001-167432 (2001-06-01), None
patent: 2001-250217 (2001-09-01), None
patent: 2002-359138 (2002-12-01), None
patent: 466486 (2001-12-01), None
patent: 548656 (2003-08-01), None
Bruenger et al., “Ion projection lithography for resistless patterning of thin magnetic films”, 25th International Conference on Micro and Nano Engineering, Rome Italy, Sep. 21-23, 1999 and Microelectron. Eng. (Netherlands), vol. 53, No. 1-4, Jun. 2000, pp. 605-608.
Eugene Chen, et al., “Magnetic tunnel junction pattern technique”, Silicon Magnetic Systems, Cypress Semiconductor, San Jose, CA, Journal of Applies Physics, vol. 93, No. 10, May 15, 2003, p. 8379.
B.D. Terris et al., “Patterning magnetic films by ion beam irradiation”, J. Appl. Phys., (USA), vol. 87, No. 9, Pt. 1-3, May 1, 2000, pp. 7004-7006.
Corporate Associates, “Physics Helps Redesign Dow Chemical,” 39 The Industrial Physicst, Apr. 1999, American Institute of Physics, p. 1.
Taiwanese Search Report conducted Jan. 3, 2009, and partial English translation of Search Report.
Taiwanese Office Action dated Mar. 5, 2009.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method and system for patterning of magnetic thin films... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and system for patterning of magnetic thin films..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and system for patterning of magnetic thin films... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4138775

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.