Method and system for optical proximity correction

Details Method and system for optical proximity correction Method and system for optical proximity correction

2005-10-04

2005-10-04

Smith, Matthew (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000

Reexamination Certificate

active

06952818

ABSTRACT:
A computer implemented method for OPC includes: storing an improper OPC pattern and a corrective treatment for the improper OPC pattern in a library storage medium; reading a layout pattern; and matching the layout pattern with the improper OPC pattern stored in the library storage medium.

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patent: 6584609 (2003-06-01), Pierrat et al.
patent: 6622297 (2003-09-01), Uno et al.
patent: 2002/0007481 (2002-01-01), Ono
patent: 2002/0040468 (2002-04-01), Uno et al.
patent: 2000-260879 (2000-09-01), None
patent: 2000-314954 (2000-11-01), None

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