Method and system for on-line monitoring plasma chamber conditio

Details Method and system for on-line monitoring plasma chamber conditio Method and system for on-line monitoring plasma chamber conditio

1998-02-27

2000-12-05

Grant, William

Data processing: generic control systems or specific application

Specific application, apparatus or process

Product assembly or manufacturing

700266, 216 60, 216 67, G06F 1900

Patent

active

061578673

ABSTRACT:
A method for operating a plasma processing system comprises the following steps. Produce a plasma in a plasma processing chamber operating upon a selected workpiece. Perform in situ detection of electromagnetic radiation of a certain wavelength generated in the plasma in the plasma processing chamber. Calculate a first intensity difference of the certain wavelength from a set point of intensity. Halt production of the plasma in the plasma processing chamber if the first intensity difference is outside of specifications.

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