Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing
Patent
1998-02-27
2000-12-05
Grant, William
Data processing: generic control systems or specific application
Specific application, apparatus or process
Product assembly or manufacturing
700266, 216 60, 216 67, G06F 1900
Patent
active
061578673
ABSTRACT:
A method for operating a plasma processing system comprises the following steps. Produce a plasma in a plasma processing chamber operating upon a selected workpiece. Perform in situ detection of electromagnetic radiation of a certain wavelength generated in the plasma in the plasma processing chamber. Calculate a first intensity difference of the certain wavelength from a set point of intensity. Halt production of the plasma in the plasma processing chamber if the first intensity difference is outside of specifications.
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Cho Ching-Wen
Hwang Yuan-Ko
Ackerman Stephen B.
Garland Steven R.
Grant William
Jones II Graham S.
Saile George O.
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