Method and system for monitoring plasma using optical...

Details Method and system for monitoring plasma using optical... Method and system for monitoring plasma using optical...

2007-12-25

2007-12-25

Toatley, Jr., Gregory J. (Department: 2877)

Optics: measuring and testing

With plural diverse test or art

C356S316000

Reexamination Certificate

active

11219540

ABSTRACT:
A method and system are presented for monitoring the optical emissions associated with a plasma used in integrated circuit fabrication. The optical emissions may be processed by an optical spectrometer to obtain a spectrum. The spectrum may be analyzed to determine the presence of particular disassociated species which are indicative of the presence of a suitable plasma and which may be desired for a deposition, etching, or cleaning process.

REFERENCES:
patent: 5910011 (1999-06-01), Cruse
patent: 6818561 (2004-11-01), Sonderman
patent: 7072028 (2006-07-01), Powell et al.
patent: 2003/0226970 (2003-12-01), Yatsiv
patent: 2005/0046825 (2005-03-01), Powell et al.

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