Method and system for measuring stray light

Details Method and system for measuring stray light Method and system for measuring stray light

2005-05-31

2005-05-31

Toatley, Jr., Gregory J. (Department: 2877)

Optics: measuring and testing

Photometers

Photoelectric

C356S237500, C250S548000

Reexamination Certificate

active

06900887

ABSTRACT:
A method and system for measuring stray light for use in an exposure apparatus uses an image sensor to be disposed at a wafer level in the exposure apparatus. The stray light is measured by preparing a reference pattern and a measuring pattern on a reticle. The reference pattern includes a light shielding region having first open regions for transmitting light to a center of an active region of the image sensor. The measuring pattern includes a light shielding region having second open regions for transmitting light to a periphery of the active region. A first intensity of light reaching the active region after being filtered by the reference pattern and a second intensity of light reaching the image sensor after being filtered by the measuring pattern are measured. The intensity of the stray light is evaluated by a difference between the first and second light intensities.

REFERENCES:
patent: 5446542 (1995-08-01), Muraoka
patent: 5539514 (1996-07-01), Shishido et al.
patent: 5783833 (1998-07-01), Sugaya et al.
patent: 6038038 (2000-03-01), Selby et al.
patent: 6313913 (2001-11-01), Nakagawa et al.

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