Method and system for locally annealing a microstructure formed

Details Method and system for locally annealing a microstructure formed Method and system for locally annealing a microstructure formed

1997-06-13

1999-11-02

Chaudhari, Chandra

Semiconductor device manufacturing: process

Radiation or energy treatment modifying properties of...

1566431, 1566571, H01L 2160

Patent

active

059769947

ABSTRACT:
A batch-compatible, post-fabrication annealing method and system are described that can be used to trim the resonance frequency and enhance the quality factor of mechanical microstructures, particularly micromechanical structures, such as micromechanical resonators. The technique involves running a current through a micromechanical structure, or through a nearby microstructure (e.g., a nearby resistor), thereby dissipating power and heating the structure to temperatures high enough to change its microstructure and/or its material properties, which then lead to changes in the microstructure's resonance frequency and quality factor. For micromechanical structures, this technique is particularly useful, since it allows for convenient, simultaneous trimming of many microstructures all at once, and can be implemented via the simple application of a voltage across the anchor points of a micromechanical structure.

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Kun Wang, et al., Frequency Trimming and Q-Factor Enhancement of Micromechanical Resonators Via Localized Filament Annealing, Transducers '97, Jun. 16-19, 1997, pp. 109-112, Chicago.
J. Peerlings, et al., Long Resonator Micromachined Tunable GaAs-A1As Fabry-Perot Filter, 1997 IEEE, vol. 9, No. 9, Sep. 9, 1997.

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