Optical: systems and elements – Light interference
Reexamination Certificate
2005-04-19
2005-04-19
Nguyen, Thong (Department: 2872)
Optical: systems and elements
Light interference
C359S035000
Reexamination Certificate
active
06882477
ABSTRACT:
A method and system of interference lithography (also known as interferometric lithography or holographic lithography) which utilizes phase-locked, scanning beams (so-called scanning beam interference lithography, or SBIL). The invention utilizes a high-precision stage that moves a substrate under overlapped and interfering pairs of coherent beams. The overlapped beams interfere, generating fringes, which form a pattern “brush” for subsequent writing of periodic and quasi-periodic patterns on the substrate. The phase of the fringes in the overlapped region is phase-locked to the motion of the precision stage. The invention includes methods for forming, overlapping, and phase-locking interfering pairs of beams on a variety of substrates; methods for measuring and controlling the period, phase, and angular orientation of fringes generated by the overlapping beams; and methods for measuring and controlling the effects of stage mechanical and thermal drift and other disturbances during the writing process.
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Everett Patrick N.
Schattenburg Mark
Gauthier & Connors LLP
Lavarias Arnel C.
Massachusetts Institute of Technology
Nguyen Thong
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