Method and system for inspection optimization in design and...

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C716S030000, C716S030000

Reexamination Certificate

active

07665048

ABSTRACT:
A method and apparatus for inspection optimization is provided. Inspection optimization improves the parametric and functional yield using optimized inspection lists for in-line semiconductor manufacturing metrology and inspection equipment.

REFERENCES:
patent: 6562638 (2003-05-01), Balasinski et al.
patent: 6610550 (2003-08-01), Pasadyn et al.
patent: 7024638 (2006-04-01), Scheffer et al.
patent: 7231628 (2007-06-01), Pack et al.
patent: 7249342 (2007-07-01), Pack et al.
patent: 7302672 (2007-11-01), Pack et al.
patent: 7318214 (2008-01-01), Prasad et al.
patent: 7418693 (2008-08-01), Gennari et al.
patent: 2003/0229410 (2003-12-01), Smith et al.
patent: 2004/0059456 (2004-03-01), Bode et al.
patent: 2004/0107412 (2004-06-01), Pack et al.
patent: 2004/0133369 (2004-07-01), Pack et al.
patent: 2005/0015739 (2005-01-01), Scheffer et al.
patent: 2005/0216877 (2005-09-01), Pack et al.
patent: 2006/0273266 (2006-12-01), Preil et al.
patent: 2007/0156379 (2007-07-01), Kulkarni et al.
patent: 2007/0233419 (2007-10-01), Pack et al.
patent: 2007/0266364 (2007-11-01), Pack et al.
patent: 2007/0288219 (2007-12-01), Zafar et al.
patent: 2008/0046846 (2008-02-01), Chew et al.
KLA Tencor, “Accelerates Reticle Design Verification for Sub-100-nm Device Production With Design Process Window Qualification Technology”, http://www.kla-tencor.com/product-releases/kla-tencor-accelerates-reticle-design-verification-for-sub-100-nm-device-production-with-design-process-window-qualification-technology.html, San Jose CA, May 7, 2003.
Lin, L. et al., “Etch Process Monitoring by Electron Beam Wafer Inspection”, Yield Management Solutions Magazine, http://www.klatencor.com/patterned-wafer/processwindowqualificationpwq.html, Summer 2007.
Office Action dated Apr. 23, 2009 for U.S. Appl. No. 11/612,446.
Office Action dated Apr. 17, 2009 for U.S. Appl. No. 11/612,422.
Office Action dated Sep. 12, 2008 for U.S. Appl. No. 11/612,422.
Office Action dated Apr. 15, 2009 for U.S. Appl. No. 11/612,432.
Office Action dated Sep. 16, 2008 for U.S. Appl. No. 11/612,432.
Office Action dated Sep. 23, 2009 for U.S. Appl. No. 11/612,432.
Office Action dated Sep. 23, 2009 for U.S. Appl. No. 11/612,422.
Notice of Allowance dated Nov. 11, 2009 for U.S. Appl. No. 11/612,446.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method and system for inspection optimization in design and... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and system for inspection optimization in design and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and system for inspection optimization in design and... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4234947

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.