Method and system for increasing throughput during location...

Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C702S084000, C438S005000, C156S345400, C216S066000

Reexamination Certificate

active

07917241

ABSTRACT:
A method and system of location specific processing on a plurality of substrates is described. The method comprises measuring metrology data for the plurality of substrates. Thereafter, the method comprises computing correction data for a first substrate using the metrology data, followed by computing correction data for a second substrate using the metrology data. While computing the correction data for a second substrate, the method comprises applying the correction data for a first substrate to the first substrate using a gas cluster ion beam (GCIB).

REFERENCES:
patent: 4361762 (1982-11-01), Douglas
patent: 4886971 (1989-12-01), Matsumura et al.
patent: 4916311 (1990-04-01), Fuzishita et al.
patent: 5863682 (1999-01-01), Abe et al.
patent: 5871805 (1999-02-01), Lemelson
patent: 6416820 (2002-07-01), Yamada et al.
patent: 6537606 (2003-03-01), Allen et al.
patent: 6560504 (2003-05-01), Goodwin et al.
patent: 6750460 (2004-06-01), Greer
patent: 2002/0130275 (2002-09-01), Mack et al.
patent: 2003/0049376 (2003-03-01), Schwarm et al.
patent: 62296357 (1987-12-01), None
Wikipedia (free on-line encyclopedia). Nov. 5, 2008. Retrieved from the Internet: URL:http://en.wikipedia.org/wiki/Assembly—line. 6 pages.
European Patent Office, International Search Report issued in corresponding PCT Application serial No. PCT/US2008/071412 dated Nov. 27, 2008.
European Patent Office, Office Action issued in related European Application No. 03 749 734.4 dated Oct. 5, 2009.
European Patent Office, Office Action issued in related European Application No. 05 729 563.6 dated Sep. 24, 2009.
Yamada, et al., “Surface modification with gas cluster ion beams”, Nuclear Instruments and Methods in Physics Research B79 (1993) 223-226 North-Holland.
Saitoh, et al., “Acceleration of cluster and molecular ions by TIARA 3 MV tandem accelerator”, Nuclear Instruments and Methods in Physics Research A 452 (2000) 61-66).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method and system for increasing throughput during location... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and system for increasing throughput during location..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and system for increasing throughput during location... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2687477

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.