Method and system for increasing product yield by...

Details Method and system for increasing product yield by... Method and system for increasing product yield by...

2008-01-29

2008-01-29

Chiang, Jack (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000, C716S030000, C716S030000, C716S030000

Reexamination Certificate

active

07325224

ABSTRACT:
The electrical performance of sub-devices is detected and the corresponding measurement data is used to control a lithography process so as to compensate for any type of process variations during a manufacturing sequence.

REFERENCES:
patent: 6405144 (2002-06-01), Toprac et al.
patent: 6449749 (2002-09-01), Stine
patent: 6493063 (2002-12-01), Seltmann et al.
patent: 6915177 (2005-07-01), Phan et al.
patent: WO 03/017322 (2003-02-01), None
Ackmann et al., “Use of Exposure compensation to improve device performance for speed and binning based on electrical parametric feedback into fabrication design,” SPIE, 3051:384-90, 1997.

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