Method and system for improving the efficiency of a...

Semiconductor device manufacturing: process – Miscellaneous

Reexamination Certificate

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C438S907000

Reexamination Certificate

active

06946411

ABSTRACT:
A technique is disclosed that allows alignment of substrates on a run-to-run basis by using the position data of one or more previously aligned substrates to determine a setpoint of a pre-alignment process for one or more subsequent substrates. The setpoint may also be determined on the basis of a predefined characteristic of the substrates to be aligned.

REFERENCES:
patent: 6813000 (2004-11-01), Nishi
patent: 2002/0016646 (2002-02-01), Kim

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