Method and system for improving exposure uniformity in a...

Details Method and system for improving exposure uniformity in a... Method and system for improving exposure uniformity in a...

2006-02-28

2006-02-28

Mathews, Alan (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S077000, C356S237500, C430S030000

Reexamination Certificate

active

07006195

ABSTRACT:
An advanced control system for a photolithography tool that receives measurement data relating to inline parameters varying with position on a substrate surface. The position sensitive measurement data is used to establish a position dependent target offset for an exposure map, thereby effectively compensating for substrate non-uniformities. Since the inline measurement data is available significantly earlier in comparison to electrical measurement data of a completed circuit element, a more accurate exposure map may be obtained taking into account the process history of the substrates.

REFERENCES:
patent: 6259521 (2001-07-01), Miller et al.
patent: 6482573 (2002-11-01), Bhakta et al.
patent: 2002/0001070 (2002-01-01), Park
patent: 2002/0012861 (2002-01-01), Luhn et al.
patent: 2002/0106821 (2002-08-01), Bode et al.

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