Method and system for improved trajectory planning and...

Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C700S121000

Reexamination Certificate

active

07389155

ABSTRACT:
A trajectory planning process receives data generated by high-level control software. This data defines positions and scan velocities. The trajectory planning process creates sequences of constant acceleration intervals that allow critical motions to be executed at maximum throughput. The trajectory planning process outputs a profile. A profile executor, using the profile output by the trajectory planner process, generates continuous synchronized, filtered, multi-axis position and acceleration commands that drive control servos. Time intervals generated by the trajectory planner are quantized to be integer multiples of a real time clock period. The trajectory planner outputs have infinite jerk, but are smoothed by filters in the profile executor to both limit jerk and minimize servo-tracking errors. The trajectory planner allows time for the profile executor filters, but does not restrict fine tuning of the shape of these filters, provided that the width of the tuned filter does not exceed the allowed time.

REFERENCES:
patent: 5625267 (1997-04-01), Gregory
patent: 5996437 (1999-12-01), Novak et al.
patent: 6008610 (1999-12-01), Yuan et al.
patent: 6069684 (2000-05-01), Golladay et al.
patent: 6260282 (2001-07-01), Yuan et al.
patent: 6285438 (2001-09-01), Hazelton et al.
patent: 6320345 (2001-11-01), Yuan et al.
patent: 6360078 (2002-03-01), Driedger et al.
patent: 6509953 (2003-01-01), Saiki et al.
patent: 6674510 (2004-01-01), Jasper et al.
patent: 2003/0055855 (2003-03-01), Wiener
patent: 1 037 114 (2000-09-01), None
patent: 1037114 (2000-09-01), None
patent: 11-312643 (1999-09-01), None
patent: 2001-250757 (2001-09-01), None
patent: WO 02/056468 (2002-07-01), None
Wronosky et al., Wafer and Reticle position system for the Extreme Ultrviolet Lithogrphy Engineering Test Stand, Feb. 1, 2002, Sandia National Lab. et al., p. 1-11.
Todd J. Bednarek, “Optomized Trajectory Planning for Robot Control,” Rensselaer at Hartford Library, Hartford, Connecticut, Apr. 1999, pp. i-v and 1-22.
Australian Patent Office Search Report mailed Apr. 5, 2004 for SG 200306775-8, 3 pages.
Pending U.S. Appl. No 09/923,397, filed Aug. 8, 2001.
Pending U.S. Appl. No. 09/757,622, filed Jan. 11, 2001.
European Search Report dated Nov. 2, 2005 from corresponding European Application No. 03026145.7.
English-language abstract of Japanese Publication No. 2000-040658, published Feb. 2, 2000.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method and system for improved trajectory planning and... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and system for improved trajectory planning and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and system for improved trajectory planning and... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2800869

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.