Method and system for handling process related variations...

Details Method and system for handling process related variations... Method and system for handling process related variations...

2007-06-26

2010-12-14

Whitmore, Stacy A (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000, C703S013000

Reexamination Certificate

active

07853904

ABSTRACT:
Disclosed is an approach for modeling and correcting for the effects of reflections during lithography processing. Thickness differences across the surfaces in different integrated circuit layers may result in reflectance-related variations. The variations may be modeled and accounted for during the design process for the integrated circuit.

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