Method and system for forming fine patterns using hologram

Optical: systems and elements – Holographic system or element – Using a hologram as an optical element

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359565, 359 1, 378 34, 378 35, G02B 532, G02B 2724, G03H 100

Patent

active

058384685

ABSTRACT:
The method for forming a fine pattern on a substrate disclosed includes a step of preparing a hologram having a pattern, a step of irradiating material waves (de Broglie waves) such as neutral beams, ion beams and electron beams on the hologram, and a step of imaging the pattern on the substrate with the material waves being interfered by passing through the hologram. The light source has a source that emits a beam having a coherent wave front. Since the fine patterns are formed by utilizing the interference of material waves, the minimum processing precision can be enhanced to the extent of the wavelength of the material wave.

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