Semiconductor device manufacturing: process – With measuring or testing – Optical characteristic sensed
Reexamination Certificate
2005-03-08
2005-03-08
Everhart, Caridad (Department: 2825)
Semiconductor device manufacturing: process
With measuring or testing
Optical characteristic sensed
C438S783000, C438S786000
Reexamination Certificate
active
06864109
ABSTRACT:
A method of determining a composition of an integrated circuit feature, including collecting intensity data representative of spectral wavelengths of radiant energy generated by a plasma during plasma nitridation of an integrated circuit feature disposed on a substrate, analysing the in intensity data to determine a peak intensity at one of the wavelengths, and determining a component concentration of the feature based on the peak intensity.
REFERENCES:
patent: 6362085 (2002-03-01), Yu et al.
patent: 6627463 (2003-09-01), Sarfaty
patent: 6669782 (2003-12-01), Thakur
patent: WO-02-39097 (2002-05-01), None
Chang Vincent S.
Chen Chi-Chun
Chen Shih-Chang
Lee Tze-Liang
Wu Chun-Lin
Everhart Caridad
Slater & Matsil L.L.P.
Taiwan Semiconductor Manufacturing Company , Ltd.
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