Method and system for controlling the quality of a reticle

Details Method and system for controlling the quality of a reticle Method and system for controlling the quality of a reticle

2007-07-10

2007-07-10

Whitmore, Stacy A (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C382S144000, C356S237400

Reexamination Certificate

active

10767358

ABSTRACT:
A method and system are presented for use in controlling the quality of a reticle. The method includes processing and analyzing reference data and test data, and generating output data indicative of the current condition of the reticle. The reference data is indicative of at least a portion of a reference pattern, which is produced on a reference article by using said reticle, when in a satisfied condition. The test data is indicative of a test pattern produced on an identical article using said reticle when in the current condition, a certain time period after said reticle has been in use or stored.

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Search Report, “International Searching Authority”, PCT/US2005/001748, (Apr. 13, 2005), 13 pgs.
Tomlinson, Wanda, et al., “Cost Effective Reticle Quality Management Strategies in Wafer Fabs”,IEEE/SEMIBoxton, MA, (Sep. 8, 1999), pp. 254-258.

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