Method and system for controlling gas system

Details Method and system for controlling gas system Method and system for controlling gas system

1998-08-07

2000-12-26

Grant, William

Data processing: generic control systems or specific application

Specific application, apparatus or process

Product assembly or manufacturing

700300, 700289, G05D 2300

Patent

active

061673234

ABSTRACT:
Flow sensors 41 and 42 for detecting a flow load including the presence of a flow of gas are provided in supply lines 2a through 2d for supplying a given gas into a treatment chamber 6. A CPU 40 is provided for previously storing control parameters corresponding to the presence of a flow of gas. The presence of a flow of gas or a flow of IPA is detected by the flow sensors 41, 42 or an IPA supply pump 43, and detected signals are transmitted to the CPU 40. On the basis of a control signal outputted from the CPU 40, a cartridge heater 14, inner and outer tube heaters 25 and 26 and an insulation heater 52 are controlled. Thus, a control parameter adopted in accordance with the presence of a flow of gas to be used is determined, so that the control parameter previously stored in a data table 100 is selected in accordance with a control mode to control the temperature or pressure of the gas.

REFERENCES:
patent: 5376213 (1994-12-01), Ueda et al.
patent: 5753891 (1998-05-01), Iwata et al.
patent: 5769952 (1998-06-01), Komino
patent: 5900103 (1999-05-01), Tomoyasu et al.

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