Method and system for context-specific mask writing

Details Method and system for context-specific mask writing Method and system for context-specific mask writing

2007-11-27

2007-11-27

Chiang, Jack (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000

Reexamination Certificate

active

11143361

ABSTRACT:
A method for generating lithography masks includes generating integrated circuit design data and using context information from the integrated circuit design data to write a mask.

REFERENCES:
patent: 4247203 (1981-01-01), Levy et al.
patent: 5553273 (1996-09-01), Liebmann
patent: 5553274 (1996-09-01), Liebmann
patent: 5567550 (1996-10-01), Smayling
patent: 5580687 (1996-12-01), Leedy
patent: 5740068 (1998-04-01), Liebmann et al.
patent: 5821014 (1998-10-01), Chen et al.
patent: 5879866 (1999-03-01), Starikov et al.
patent: 5932377 (1999-08-01), Ferguson et al.
patent: 5965306 (1999-10-01), Mansfield et al.
patent: 6051347 (2000-04-01), Tzu et al.
patent: 6168891 (2001-01-01), Shibata
patent: 6282696 (2001-08-01), Garza et al.
patent: 6285488 (2001-09-01), Sandstrom
patent: 6421820 (2002-07-01), Mansfield et al.
patent: 6456899 (2002-09-01), Gleason et al.
patent: 6526550 (2003-02-01), Badding et al.
patent: 6529621 (2003-03-01), Glasser et al.
patent: 6535774 (2003-03-01), Bode et al.
patent: 6560766 (2003-05-01), Pierrat et al.
patent: 6571383 (2003-05-01), Butt et al.
patent: 6578188 (2003-06-01), Pang et al.
patent: 6579651 (2003-06-01), Subramanian et al.
patent: 6625801 (2003-09-01), Pierrat et al.
patent: 6634018 (2003-10-01), Randall et al.
patent: 6658640 (2003-12-01), Weed
patent: 6670082 (2003-12-01), Liu et al.
patent: 6703167 (2004-03-01), LaCour
patent: 6748578 (2004-06-01), Cobb
patent: 6787271 (2004-09-01), Cote et al.
patent: 6868537 (2005-03-01), Ho et al.
patent: 6901574 (2005-05-01), LaCour et al.
patent: 7107571 (2006-09-01), Chang et al.
patent: 2002/0026626 (2002-02-01), Randall et al.
patent: 2002/0102476 (2002-08-01), Hayano et al.
patent: 2002/0155357 (2002-10-01), LaCour
patent: 2002/0157068 (2002-10-01), LaCour et al.
patent: 2002/0160281 (2002-10-01), Subramanian et al.
patent: 2003/0018948 (2003-01-01), Chang et al.
patent: 2003/0023939 (2003-01-01), Pierrat et al.
patent: 2003/0126581 (2003-07-01), Pang et al.
patent: 2003/0160980 (2003-08-01), Olsson et al.
patent: 2003/0165749 (2003-09-01), Fritze et al.
patent: 2003/0200523 (2003-10-01), Takahashi et al.
patent: 2004/0013952 (2004-01-01), Elian et al.
patent: 2004/0044984 (2004-03-01), Keogan et al.
patent: 2004/0067423 (2004-04-01), Chen et al.
patent: 2004/0107412 (2004-06-01), Pack et al.
patent: 2004/0133369 (2004-07-01), Pack et al.
patent: 2004/0172610 (2004-09-01), Liebmann et al.
patent: 1031876 (2000-08-01), None
Matsuyama, T. et al. “The novel inspection system with design rule check for high accuracy reticules” Proceedings of the SPIE—The International Society of Optical Engineering (1999) 3748:563-571.
McCall, J. et al. “Integrated method of mask data checking and inspection data prep for manufacturable mask inspection: inspection rule violations” Proceedings of the SPIE—The International Society for Optical Engineering (Oct. 3, 2001) 4562:161-170.
International Search Report for PCT/US2003/021996 dated May 4, 2004.
Goering, R. “SEMI's Oasis provides respite from GDSII”,EE TimesOct. 1, 2002.
Liebmann, L.W. et al., “TCAD Development for Lithography Resolution Enhancement”, IBM Journal of Research and Development, vol. 45, No. 5, Sep. 2001.
Pack, R.C. et al., “GDS-3 Initiative: Advanced Design-through-Chip Infrastructure for Sub-Wavelength Technology”, Proceedings of SPIE, vol. 4692, 2002, pp. 566-584.
Wong, Alfred K., “Resolution Enhancement Techniques in Optical Lithography”, SPIE Press, 2001, Chapter 1.

Affiliated with

Also associated with

Rating

Method and system for context-specific mask writing does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and system for context-specific mask writing, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and system for context-specific mask writing will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3803761