Method and system for closing plate take-over in immersion...

Photocopying – Projection printing and copying cameras – With temperature or foreign particle control

Reexamination Certificate

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Details

C355S053000, C355S072000, C355S077000

Reexamination Certificate

active

07728952

ABSTRACT:
Aspects of the present disclosure provide a method and a system for closing plate take-over in immersion lithography. A plate holder is provided for a closing plate in a wafer holder of an immersion lithography system. An optical detector is provided below the plate holder for determining whether a light signal passing through the closing plate is aligned with the plate holder using the optical detector. If the light signal is aligned, a fluid containment mechanism is lowered, and the closing plate is placed into the plate holder. Alternatively, the fluid containment mechanism is lowered to surface of the closing plate, the closing plate is affixed to the mechanism, and the mechanism is raised with the closing plate. If the light signal is not aligned, an error is triggered and the scanner is stopped.

REFERENCES:
patent: 7119876 (2006-10-01), Van Der Toorn et al.
patent: 7372538 (2008-05-01), Binnard
patent: 2005/0286032 (2005-12-01), Lof et al.
patent: 2006/0103820 (2006-05-01), Donders et al.
patent: 2006140498(A) (2006-06-01), None
Japanese Office Action on Application No. JP2006-140498 dated Jul. 24, 2009, 6 pages.

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