Method and system for cleaning semiconductor elements

Details Method and system for cleaning semiconductor elements Method and system for cleaning semiconductor elements

2006-06-27

2006-06-27

Markoff, Alexander (Department: 1746)

Cleaning and liquid contact with solids

Processes

Using sequentially applied treating agents

C134S001000, C134S102100, C134S902000

Reexamination Certificate

active

07067017

ABSTRACT:
The invention relates to a method and system for cleaning semiconductor elements accommodated in a tank which uses ozonized, deionized (DI) ultrapure water. According to the invention, ozone is generated in an ozone generator (3) according to the principal of silent electric discharge while admitting highly pure oxygen. Said ozone is fed to a contactor (7) through which DI water flows. The ozone is then dissolved in the DI water. While optionally admitting additional chemicals, the ozonized DI water is conducted through the tank (12) holding the semiconductor elements in order to clean the same, and the used DI water is carried away (15). In order to stabilize the ozone concentration, CO2is added to the ozone/oxygen mixture generated by the ozone generator (7).

REFERENCES:
patent: 6080531 (2000-06-01), Carter et al.
patent: 6786976 (2004-09-01), Gottschalk et al.
patent: 0 497 247 (1992-08-01), None
patent: WO 95/02895 (1995-01-01), None

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