Method and system for cleaning a photomask

Details Method and system for cleaning a photomask Method and system for cleaning a photomask

2007-02-06

2008-12-09

Carrillo, Sharidan (Department: 1792)

Cleaning and liquid contact with solids

Processes

Using sequentially applied treating agents

C134S002000, C134S003000, C134S025400, C134S027000, C134S028000, C134S029000, C134S034000, C134S036000, C134S041000, C134S042000, C134S902000

Reexamination Certificate

active

07462248

ABSTRACT:
A method for cleaning a photomask includes cleaning the photomask with a chemical cleaner, introducing a solution to the photomask, the solution is configured to react with residuals generated from the chemical cleaner to form insoluble precipitates, and rinsing the photomask with a fluid to remove the insoluble precipitates from the photomask.

REFERENCES:
patent: 4569695 (1986-02-01), Yamashita et al.
patent: 6071376 (2000-06-01), Nagamura et al.
patent: 2002/0155360 (2002-10-01), Tange et al.
patent: 2003/0051740 (2003-03-01), Chao et al.
patent: 2007/0068558 (2007-03-01), Papanu et al.

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