Method and system for automatically detecting exposed...

Details Method and system for automatically detecting exposed... Method and system for automatically detecting exposed...

2006-05-23

2009-11-17

Young, Christopher G (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

C355S053000, C355S055000, C355S067000, C355S077000, C382S145000, C382S149000

Reexamination Certificate

active

07618755

ABSTRACT:
By automatically estimating the focus status of individual substrates or lots on the basis of focus-specific tool information obtained from the exposure tool, such as tilt angle ranges used during the automatic focusing procedures, possible hot spot errors may be detected highly efficiently prior to releasing the substrates to a subsequent etch process. Consequently, yield losses may be reduced. Moreover, possible error sources for hot spot errors may be identified.

REFERENCES:
patent: 6215896 (2001-04-01), Greig et al.
patent: 7245356 (2007-07-01), Hansen

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