Method and system for analyzing the quality of an OPC mask

Details Method and system for analyzing the quality of an OPC mask Method and system for analyzing the quality of an OPC mask

2005-09-30

2008-03-04

Chiang, Jack (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000

Reexamination Certificate

active

07340706

ABSTRACT:
The present invention provides a method and system for analyzing the quality of an OPC mask. The method includes receiving a target layer from a target design, receiving an OPC mask layer from the OPC mask. The method also includes classifying each cell of at least one of the target layer and the OPC mask layer as either repeating or non-repeating, and for each repeating cell, recognizing geometric points in the target layer to determine quality measuring groups. The method also includes simulating the OPC mask layer based on the quality measuring groups, measuring edge placement errors (EPEs) based on at least one of the geometric points, and providing an EPE layer representing EPEs greater than an EPE threshold.

REFERENCES:
patent: 6704921 (2004-03-01), Liu
patent: 6928634 (2005-08-01), Granik et al.
patent: 6978438 (2005-12-01), Capodieci
patent: 7155698 (2006-12-01), Gennari
patent: 7237221 (2007-06-01), Granik et al.

Affiliated with

Also associated with

Rating

Method and system for analyzing the quality of an OPC mask does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and system for analyzing the quality of an OPC mask, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and system for analyzing the quality of an OPC mask will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3971821