Method and structures for reduced parasitic capacitance in...

Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Ball or nail head type contact – lead – or bond

Reexamination Certificate

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C257S781000, C257S784000, C257S786000, C257S774000, C257S780000, C257S503000, C257S758000, C438S612000

Reexamination Certificate

active

06909196

ABSTRACT:
A method of reducing parasitic capacitance in an integrated circuit having three or more metal levels is described. The method comprises forming a bond pad at least partially exposed at the top surface of the integrated circuit, forming a metal pad on the metal level below the bond pad and forming an underlying metal pad on each of the one or more lower metal levels. In the illustrated embodiments, the ratio of an area of at least one of the underlying metal pads to the area of the bond pad is less than 30%. Parasitic capacitance is thus greatly reduced and signal propagation speeds improved.

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Ker, et al., Design on the Low-Capacitance Bond Pad for High-Frequency I/O Circuits in CMOS Technology, IEEE Transactions on Electron Devices, vol. 48, No. 12, Dec. 2001, pp. 2953-2956.
Ching et al.,Bond Pad Structure Reliability,1988 IEEE/IRPS, p. 64-70.

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