Method and structure for crystallizing a film

Details Method and structure for crystallizing a film Method and structure for crystallizing a film

1997-07-17

2000-10-10

Wilczewski, Mary

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

On insulating substrate or layer

438158, 438487, 438488, 438535, 438795, 438563, 148DIG91, H01L 21324, H01L 21225

Patent

active

061301205

ABSTRACT:
A method and structure for crystallizing film is disclosed. The method includes the steps of forming a film on a substrate, forming a lens on the film to focus an electro-magnetic wave on the film and directing the electro-magnetic wave on the film inclusive of the lens to crystallize the film.

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patent: 5888841 (1999-03-01), Snyder
Wolf et al., Silicon Processing for the VLSI Era, vol. 1: Process Technology, Lattice Press, pp. 57-58 (1986).

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