Electricity: measuring and testing – Impedance – admittance or other quantities representative of... – Lumped type parameters
Reexamination Certificate
2008-04-01
2008-04-01
Nguyen, Ha Tran (Department: 2829)
Electricity: measuring and testing
Impedance, admittance or other quantities representative of...
Lumped type parameters
Reexamination Certificate
active
10836827
ABSTRACT:
A method and a relative test structure for measuring the coupling capacitance between two interconnect lines exploits the so-called cross-talk effect and keeps an interconnect line at a constant reference voltage. This approach addresses the problem of short-circuit currents that affect known test structures, and allows a direct measurement of the coupling capacitance between the two interconnect lines. Capacitance measurements may also be used for determining points of interruption of interconnect lines. When a line is interrupted, the measured coupling capacitance is the capacitance of a single conducting branch. The position of points of interruption of an interconnect line is determined by measuring the coupling capacitance of all segments of the line with a second conducting line.
REFERENCES:
patent: 5095750 (1992-03-01), Suzuki et al.
patent: 5641911 (1997-06-01), Ryhanen
patent: 6366098 (2002-04-01), Froment
patent: 6856143 (2005-02-01), McNutt et al.
patent: 6934669 (2005-08-01), Suaya et al.
patent: 2002/0116696 (2002-08-01), Suaya et al.
patent: 2005/0024077 (2005-02-01), Huang et al.
Kühn et al., “Interconnect Capacitances, Crosstalk, and Signal Delay in Vertically Integrated Circuits”, Siemens AG, Institute for Integrated Circuits & Fraunhofer Institute for Solid State Technology, München, Germany, © 1995 IEEE, pp. 10.3.1 to 10.3.4, month unavailable.
Bogliolo Alessandro
Bortesi Luca
Vendrame Loris
Allen Dyer Doppelt Milbrath & Gilchrist, P.A.
Nguyen Ha Tran
Nguyen Tung X.
STMicroelectronics S.r.l.
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