Method and mechanism for performing DRC processing with...

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design

Reexamination Certificate

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C716S030000, C716S030000, C716S030000, C716S030000, C716S030000, C430S005000, C430S030000

Reexamination Certificate

active

07418682

ABSTRACT:
A method and mechanism is disclosed for performing a spacing rule DRC check that does not require an excessive number of passes through the IC design. In one approach, a two-pass approach is employed to perform a spacing check. In an approach, a polygons are associated with a family of related polygons.

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