Method and furnace for the vapor phase deposition of...

Details Method and furnace for the vapor phase deposition of... Method and furnace for the vapor phase deposition of...

2007-07-10

2007-07-10

Le, Dung A. (Department: 2818)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

C438S714000, C438S729000, C118S119000, C118S715000

Reexamination Certificate

active

10675049

ABSTRACT:
A method and a furnace are provided for the vapor phase deposition of components onto semiconductor substrates. The main flow direction of the process gases can be varied or reversed by the furnace in the course of the method. This prevents temperature and concentration inhomogeneities of the process gas within the furnace, and permits the components to be uniformly deposited onto the semiconductor substrates.

REFERENCES:
patent: 5484484 (1996-01-01), Yamaga et al.
patent: 6045617 (2000-04-01), Keller
patent: 6074202 (2000-06-01), Yagi et al.
patent: 6184049 (2001-02-01), Watanabe et al.
patent: 197 43 922 (1999-04-01), None
patent: 63065080 (1988-03-01), None
patent: 02-074587 (1990-03-01), None
patent: 04-343412 (1992-11-01), None

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