Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
Patent
1996-01-30
1997-08-19
Bowers, Jr., Charles L.
Semiconductor device manufacturing: process
Coating of substrate containing semiconductor region or of...
Insulative material deposited upon semiconductive substrate
118724, H01L 21318
Patent
active
056588330
ABSTRACT:
In a process of fabricating an integrated circuit, a method for uniformly depositing silicon nitride by disposing a plurality of dummy discs beside the production wafers. The dummy discs are made of quartz or silicon carbide. Since the dummy discs can be used longer before been recycled, plenty dummy discs can be saved from disuse. Furthermore, the cost of the management and treatment of the dummy discs is great reduced in this way.
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Chen Shih-Ching
Houn Edward
Bowers Jr. Charles L.
United Microelectronics Corporation
Whipple Matthew
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