Method and device using ArF photoresist

Details Method and device using ArF photoresist Method and device using ArF photoresist

1998-01-07

2000-04-04

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

522151, 522153, 522154, 522113, G03C 172, G03C 174

Patent

active

060459670

ABSTRACT:
A novel photoresist copolymer, consisting of at least two aliphatic cyclo-olefins and an amine, which is useful for the photolithography using ArF as a light source. The photoresist prepared from the copolymer can be patterned with high resolution.

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