Method and device for treating substrates

Details Method and device for treating substrates Method and device for treating substrates

1993-03-16

1994-04-05

Weisstuch, Aaron

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20429808, 20429823, 20429826, C23C 1454, C23C 1456

Patent

active

053002059

ABSTRACT:
The invention relates to a device for coating substrates by sputtering out of a plasma with at least one anode, one cathode, and an electric dc current voltage source, connectable pulse-wise to the anode/cathode path. The length of the voltage pulses and/or the interval between the pulses is regulatable.

REFERENCES:
patent: 4488956 (1984-12-01), Scherer et al.
patent: 4902394 (1990-02-01), Kenmotsu et al.
patent: 5015493 (1991-05-01), Gruen

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