Method and device for surface-treating substrates

Details Method and device for surface-treating substrates Method and device for surface-treating substrates

2005-02-15

2005-02-15

Beck, Shrive P. (Department: 1762)

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

C427S575000, C427S237000, C427S255500, C427S405000, C118S718000, C118S7230AN, C118S7230ER, C118S7230MW

Reexamination Certificate

active

06855379

ABSTRACT:
A method for surface treatment of at least one electrically conducting substrate or a substrate that has been coated so as to be conducting (1) by means of a gas placed in the region of an electric discharge (2). The discharge region is restricted by at least two essentially opposite sides of the substrate surface to be treated (7). This process is especially suitable for treating band-shaped and continuously supplied substrates.

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