Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Reexamination Certificate
2003-01-27
2009-12-29
Michener, Jennifer K (Department: 1795)
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
C204S298050, C204S298060, C204S298120, C204S192100, C204S192150
Reexamination Certificate
active
07638019
ABSTRACT:
A semiconductor or nonconductor vapor is generated by sputtering targets11U,11D in a first sputtering chamber10, while a metal vapor is generated by sputtering targets21U,21D in a second sputtering chamber20. The semiconductor or nonconductor vapor and the metal vapor are aggregated to clusters during travelling through a cluster-growing tube32and injected as a cluster beam to a high-vacuum deposition chamber30, so as to deposit composite clusters on a substrate35. The produced composite clusters are useful in various fields due to high performance, e.g. high-sensitivity sensors, high-density magnetic recording media, nano-magnetic media for transportation of medicine, catalysts, permselective membranes, optical-magnet sensors and low-loss soft magnetic materials.
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Hihara Takehiko
Katoh Ryoji
Sumiyama Kenji
Band Michael
Japan Science and Technology Agency
Michener Jennifer K
The Webb Law Firm
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