Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1998-01-07
2000-05-23
Kiliman, Leszek
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
2041922, 20419232, 20429801, 20429807, 20429833, 427131, 427132, 427250, G11B 566
Patent
active
060662409
ABSTRACT:
A method and a device for manufacturing a thin film by a vacuum deposition method, and a magnetic recording medium produced thereby are disclosed. A thin film of high quality is mass-produced while introducing reaction gas to a thin film forming section from a nozzle consisting of minute tubes, so that the flow of evaporated atoms is not disturbed by the reaction gas.
REFERENCES:
patent: 4855175 (1989-08-01), Wakai et al.
patent: 5073449 (1991-12-01), Niimi et al.
patent: 5418059 (1995-05-01), Sugita et al.
patent: 5534324 (1996-07-01), Sugite
patent: 5759710 (1998-06-01), Honda
"Recording Characteristics of Obliquely Evaporated Thin Co-O Films", Journal of the Magnetics Society of Japan, vol. 18, Supplement, No. S1, pp. 431-434.
Honda Kazuyoshi
Maezawa Yoshiharu
Odagiri Masaru
Okazaki Sadayuki
Kiliman Leszek
Matsushita Electric - Industrial Co., Ltd.
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