Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Amorphous semiconductor
Reexamination Certificate
2011-06-28
2011-06-28
Sarkar, Asok K (Department: 2891)
Semiconductor device manufacturing: process
Formation of semiconductive active region on any substrate
Amorphous semiconductor
C438S478000, C438S604000, C257SE29072, C257SE29089
Reexamination Certificate
active
07968435
ABSTRACT:
A semiconductor device and method are being disclosed. The semiconductor device discloses an InAs layer, a plurality of group III-V ternary layers supported by the InAs layer, and a plurality of group III-V quarternary layers supported by the InAs layer, wherein the group III-V ternary layers are separated from each other by a single group III-V quarternary layer. The method discloses providing an InAs layer, growing a plurality of group III-V ternary layers, and growing a plurality of group III-V quarternary layers, wherein the group III-V ternary layers are separated from each other by a single group III-V quarternary layer and are supported by the InAs layer.
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Chow David
Deelman Peter
Elliott Ken
HRL Laboratories LLC
Ladas & Parry
Sarkar Asok K
Slutsker Julia
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