Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Reexamination Certificate
2007-04-17
2007-04-17
Chen, Bret (Department: 1762)
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
C118S7230AN, C118S7230MP
Reexamination Certificate
active
10494528
ABSTRACT:
A plasma generation device for generating plasma uniformly over a large surface area by very high frequency (VHF), which is installed in a plasma chemical vapor deposition apparatus. A first and a second power supply section are installed on both ends of the discharge electrode installed in a plasma chemical vapor deposition apparatus, and are supplied with alternate cycles: the first cycle wherein the first and second power supply sections receive high frequency waves at the same frequency, and a second cycle wherein different high frequency waves are received. In this manner, the state of plasma generation may be varied in each cycle, and when averaged over time, it makes possible uniform plasma generation over a large surface area.
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Kawamura Keisuke
Mashima Hiroshi
Sasakawa Eishiro
Takano Akemi
Takatuka Hiromu
Chen Bret
Mitsubishi Heavy Industries Ltd.
Oblon & Spivak, McClelland, Maier & Neustadt P.C.
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