Method and device for generating uniform high-frequency...

Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C118S7230AN, C118S7230MP

Reexamination Certificate

active

10494528

ABSTRACT:
A plasma generation device for generating plasma uniformly over a large surface area by very high frequency (VHF), which is installed in a plasma chemical vapor deposition apparatus. A first and a second power supply section are installed on both ends of the discharge electrode installed in a plasma chemical vapor deposition apparatus, and are supplied with alternate cycles: the first cycle wherein the first and second power supply sections receive high frequency waves at the same frequency, and a second cycle wherein different high frequency waves are received. In this manner, the state of plasma generation may be varied in each cycle, and when averaged over time, it makes possible uniform plasma generation over a large surface area.

REFERENCES:
patent: 6245690 (2001-06-01), Yau et al.
patent: 6456010 (2002-09-01), Yamakoshi et al.
patent: 6755150 (2004-06-01), Lai et al.
patent: 2001/0021422 (2001-09-01), Yamakoshi et al.
patent: 2003/0164225 (2003-09-01), Sawayama et al.
patent: 2005/0223990 (2005-10-01), Kawamura et al.
patent: 11-111622 (1999-04-01), None
patent: 2989279 (1999-10-01), None
patent: 2000-3878 (2000-01-01), None
patent: 2000-58465 (2000-02-01), None
patent: 2000-323297 (2000-11-01), None
patent: 2001-7028 (2001-01-01), None
patent: 2002-43225 (2002-02-01), None
patent: 2002-322563 (2002-11-01), None
patent: 00/79844 (2000-12-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method and device for generating uniform high-frequency... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and device for generating uniform high-frequency..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and device for generating uniform high-frequency... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3775173

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.