Method and device for drying substrate

Details Method and device for drying substrate Method and device for drying substrate

2008-05-27

2008-05-27

Lu, Jiping (Department: 3749)

Drying and gas or vapor contact with solids

Process

Gas or vapor contact with treated material

C034S487000, C034S410000, C134S021000, C134S095300, C134S902000

Reexamination Certificate

active

07377053

ABSTRACT:
A device for drying substrate comprising a processing vessel housing a specified number of substrates such as semiconductor wafers installed erectedly in parallel to one another, a first substrate supporting member supporting substrates within the processing vessel, the processing fluid supplying section supplying to the processing vessel, the processing fluid for performing processing such as cleaning processing on the substrates, a processing fluid exhausting section exhausting processing fluid from the processing vessel, and a drying fluid supplying section supplying, to the processing vessel, the liquid drops of drying fluid for performing drying processing on the substrates.

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