Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1999-07-07
2000-09-05
Diamond, Alan
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419211, 2041921, 2041922, 20419222, 20419215, 20429812, 20429809, 20429823, 20429827, 20429828, 20419216, C23C 1434, C23C 1436
Patent
active
061137529
ABSTRACT:
A device and a process for multilayer PVD ("Physical Vapor Deposition") coating of substances includes one or more sputter target systems. A sputter target system generally consists of a plurality of individual targets arranged in the cross-sectional shape of a hollow regular polygon. The arrangement is rotatably mounted about the axis of symmetry of the hollow polygon. In the interior of the hollow polygon, preferably magnetrons (inner magnetrons) are present. By virtue of shielding, only one individual target of the sputter target system is exposed to the ionic bombardment at any one time. The multilayer coating is accomplished according to the invention by a coating strategy with step wise rotation, controlled according to plan, of the sputter target system in angular steps corresponding to the order of symmetry of the hollow polygon. Besides magnetron sputter, the invention is applicable also to other PVD coating processes, preferably to coating by means of electric arc, low-voltage electron beam and/or laser-supported evaporation or a combination of such processes.
REFERENCES:
patent: 4166018 (1979-08-01), Chapin
patent: 4356073 (1982-10-01), McKelvey
patent: 4443318 (1984-04-01), McKelvey
patent: 4793908 (1988-12-01), Scott et al.
Diamond Alan
Techno-Coat Oberflachentechnik GmbH
LandOfFree
Method and device for coating substrate does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and device for coating substrate, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and device for coating substrate will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2208445