Method and device for cleaning substrates

Details Method and device for cleaning substrates Method and device for cleaning substrates

1988-11-15

1989-10-03

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

134 1, 134 30, 134102, 134105, 156643, 156646, 156651, 156657, 156662, 156345, B44C 122, C03C 1500, C03C 2506, B08B 312

Patent

active

048714160

ABSTRACT:
For cleaning substrates in a cleaning device, a reaction furnace of the cleaning device in which a substrate has been installed is evacuated and then supplied with a reducing gas, and a natural oxide film on the substrate is removed by heating it in an atmosphere of reducing gas, the reaction furnace is then is evacuated and a reactive gas is introduced into the reaction furnace, and contaminants on the substrate are removed by etching the substrate in the reactive gas that has been chemically activated by UV radiation.

REFERENCES:
patent: 4149905 (1979-04-01), Levinstein et al.
patent: 4260649 (1981-04-01), Dension et al.
patent: 4693779 (1987-09-01), Okuhira et al.
patent: 4718974 (1988-01-01), Minaee
patent: 4731158 (1988-03-01), Brannon
IBM Technical Disclosure Bulletin, vol. 27, No. 7B, Dec./1984.
Journal of the Electrochemical Society, vol. 134, No. 8A, Aug. 87.
Journal of Vacuum Science & Technology/A vol. 4, No. 3, May/June 1986.
VLSI Technology, p. 149 (Oxidation).

Affiliated with

Also associated with

Rating

Method and device for cleaning substrates does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and device for cleaning substrates, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and device for cleaning substrates will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-662139