Method and device for checking lithography data

Details Method and device for checking lithography data Method and device for checking lithography data

2006-06-08

2009-06-16

Kik, Phallaka (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C700S120000, C700S121000, C430S005000, C378S035000

Reexamination Certificate

active

07549143

ABSTRACT:
Devices and methods are provided that include advantages such as the ability to identify sizes, shapes and locations of frequently unwanted additional features that occur as a result of photolithographic interference. The additional feature information is obtained through use of simulation methods with reduced processing time or solving a system of equations. This allows a user to quickly find information about additional feature printing before the features are printed, and before the reticle is made.

REFERENCES:
patent: 5504793 (1996-04-01), Chen
patent: 5625764 (1997-04-01), Tsujimoto et al.
patent: 5715385 (1998-02-01), Stearns et al.
patent: 5946479 (1999-08-01), Sakaguchi et al.
patent: 6051027 (2000-04-01), Kapur et al.
patent: 6127071 (2000-10-01), Lu
patent: 6226560 (2001-05-01), Hama et al.
patent: 6543045 (2003-04-01), Ludwig et al.
patent: 6606739 (2003-08-01), Kanatake et al.
patent: 6625792 (2003-09-01), Yamasaki
patent: 6721694 (2004-04-01), Lambrecht et al.
patent: 6811933 (2004-11-01), Levenson
patent: 6892365 (2005-05-01), Culp et al.
patent: 6934928 (2005-08-01), Juengling
patent: 6957414 (2005-10-01), Ludwig et al.
patent: 6981241 (2005-12-01), Ludwig et al.
patent: 6985161 (2006-01-01), Politis
patent: 7096452 (2006-08-01), Alvarez-Gomariz et al.
patent: 7376266 (2008-05-01), Simard et al.
patent: 2001/0055019 (2001-12-01), Sowizral et al.
patent: 2002/0039691 (2002-04-01), Czech et al.
patent: 2002/0046392 (2002-04-01), Ludwig et al.
patent: 2002/0062206 (2002-05-01), Liebchen
patent: 2002/0177050 (2002-11-01), Tanaka
patent: 2002/0182895 (2002-12-01), Butschke et al.
patent: 2003/0118250 (2003-06-01), Tlaskal et al.
patent: 2003/0140331 (2003-07-01), Ludwig et al.
patent: 2003/0148195 (2003-08-01), Takeuchi
patent: 2003/0229882 (2003-12-01), Ludwig et al.
patent: 2004/0044980 (2004-03-01), Juengling
patent: 2004/0209170 (2004-10-01), Broeke et al.
patent: 2004/0268291 (2004-12-01), Alvarez-Gomariz et al.
patent: 2005/0034092 (2005-02-01), Juengling
patent: 2005/0048381 (2005-03-01), Takeuchi
patent: 2005/0051873 (2005-03-01), Jin
patent: 2005/0278685 (2005-12-01), Granik et al.
patent: 2006/0235663 (2006-10-01), Alvarez et al.
patent: 2006/0277522 (2006-12-01), Shi et al.
patent: WO-0209152 (2002-01-01), None

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