Method and device for checking lithography data

Details Method and device for checking lithography data Method and device for checking lithography data

2006-06-08

2009-06-16

Kik, Phallaka (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000, C716S030000, C700S097000, C700S120000, C700S121000, C703S002000, C703S014000, C430S005000, C378S035000, C715S245000, C715S763000, C715S964000, C345S420000, C345S619000, C345S423000, C345S581000

Reexamination Certificate

active

07549142

ABSTRACT:
Devices and methods are provided that include advantages such as the ability to identify sizes, shapes and locations of frequently unwanted additional features that occur as a result of photolithographic interference. The additional feature information is obtained through use of simulation methods with reduced processing time or solving a system of equations. This allows a user to quickly find information about additional feature printing before the features are printed, and before the reticle is made.

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