Method and device for checking lithography data

Details Method and device for checking lithography data Method and device for checking lithography data

2006-08-22

2006-08-22

Kik, Phallaka (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000, C382S144000, C382S154000, C382S203000

Reexamination Certificate

active

07096452

ABSTRACT:
Devices and methods are provided that include advantages such as the ability to identify sizes, shapes and locations of frequently unwanted additional features that occur as a result of photolithographic interference. The additional feature information is obtained through use of simulation methods with reduced processing time or solving a system of equations. This allows a user to quickly find information about additional feature printing before the features are printed, and before the reticle is made. In one example, a portion of a region such as a semiconductor lithography pattern is subtracted from consideration in identifying potential optical interactions. In one example, a ring-like region remains and is analyzed.

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