Method and control system for improving CMP process by...

Details Method and control system for improving CMP process by... Method and control system for improving CMP process by...

2005-12-06

2005-12-06

Nguyen, George (Department: 3723)

Abrading

Precision device or process - or with condition responsive...

Computer controlled

C451S041000, C451S001000, C451S287000, C451S288000, C451S011000, C451S166000

Reexamination Certificate

active

06971944

ABSTRACT:
A method and control system for detecting harmonic oscillation in a chemical mechanical polishing process and reacting thereto, such as by taking steps to at least one of: 1) reduce or eliminate the harmonic oscillation; and 2) counter the noise which is associated with the harmonic oscillation. By reducing or eliminating harmonic oscillation, films with reduced structure strengths including low k dielectric films can be used. By countering the noise, the quality of the work environment is improved.

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patent: 6424137 (2002-07-01), Sampson
patent: 6443416 (2002-09-01), Jones

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