Method and computer program product for detecting potential...

Details Method and computer program product for detecting potential... Method and computer program product for detecting potential...

2005-12-29

2008-10-07

Do, Thuan (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000, C716S030000, C716S030000

Reexamination Certificate

active

07434198

ABSTRACT:
A method of detecting potential failures from a corrected mask design for an integrated circuit includes steps of receiving as input a corrected mask design for an integrated circuit, searching the corrected mask design to find a critical edge of a polygon that is closer than a selected minimum distance from a polygon edge opposite the critical edge, constructing a critical region bounded by the critical edge and the polygon edge opposite the critical edge, comparing the critical region to a potential defect criterion, and generating as output a location of the critical region when the critical region satisfies the potential defect criterion.

REFERENCES:
patent: 5879844 (1999-03-01), Yamamoto et al.
patent: 2005/0132306 (2005-06-01), Smith et al.

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