Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
Reexamination Certificate
2007-10-30
2007-10-30
Ahmed, Shamim (Department: 1765)
Etching a substrate: processes
Gas phase etching of substrate
Application of energy to the gaseous etchant or to the...
C216S058000, C216S059000, C438S706000, C438S710000, C315S111210, C427S099300, C427S569000
Reexamination Certificate
active
10198740
ABSTRACT:
Method for generating an atmospheric pressure glow plasma (APG), wherein said plasma is generated in a discharge space between a plurality of electrodes. A dielectric is present on at least one of said electrodes, said dielectric having a boundary surface with said plasma enabling interactions between said plasma and said surface. Said dielectric is arranged for releasing electrons contributing to said plasma from said surface by said interactions.
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Aldea Eugen
De Vries Hindrik Willem
Mori Fuyuhiko
Van De Sanden Mauritius Cornelius Maria
Ahmed Shamim
Davidson Berquist Jackson & Gowdey LLP
Fuji Photo Film B.V.
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