Radiant energy – Irradiation of objects or material
Reexamination Certificate
2008-05-06
2008-05-06
Berman, Jack I. (Department: 2881)
Radiant energy
Irradiation of objects or material
C250S397000, C250S492200, C324S071300
Reexamination Certificate
active
11241197
ABSTRACT:
The PSF for a metrology array for high resolution particle beam profile measurement has been improved by improving five major elements of the metrology array. While improvement in each of the five elements provides and improved PSF, a combination of all five of the elements provides an unexpected synergistic effect. The individual elements include the use of a plurality of slots as apertures; use of a high-Z material in forming the array; employing sidewalls on the slotted opening apertures where the sidewall forms an angle with a horizontal surface at the base of the array which is at least 75°; employing a knife edge where the upper corner radius ranges from about 1 nm to about 5 nm; and providing a surface finish at the upper corner of each knife edge which is less than 5 nm RMS.
REFERENCES:
patent: 5622796 (1997-04-01), Canestrari et al.
patent: 5798947 (1998-08-01), Ye et al.
patent: 5825670 (1998-10-01), Chernoff et al.
patent: 6111646 (2000-08-01), Naulleau et al.
patent: 6137578 (2000-10-01), Ausschnitt
patent: 2002/0171922 (2002-11-01), Shiraishi
patent: 2005/0122593 (2005-06-01), Johnson
patent: 2007/0057204 (2007-03-01), Kruit et al.
patent: WO 2004/090979 (2001-02-01), None
Diebold, Alain C., et al. “A Critical Analysis of Techniques and Future CD Metrology Needs”, Solid State Technology, pp. 63-64, 66, 68, and 70, Jul. 2003.
Shirasaki, H., “Arbitrary 3D Linewidth Form Measurement Simulations for the Next-Generation Semiconductor Circuits by Scatterometry Using the FDTD Method”, Metrology, Inspection, and Process Control for Microlithography XVIII, edited by Richard M. Silver,Proc. of SPIE, vol. 5375, pp. 1339-1345, SPIE, Bellingham, WA, 2004.
Sills, Robert M. et al., “E-Beam System Metrology”,Solid State Technology, pp. 191-196, Sep. 1983.
Wittmann, R.C. et al., “Nonideal Measurement Locations in Planar Near-Field Antenna Metrology”, National Institute of Standards and Technology, 325 Broadway, Boulder, CO 80303-3328, U.S. Government Work Not Protected by U.S Copyright.
Xie, Xiaolin et al., “Characterizing STI CMP Processes With and STI Test Mask Having Realistic Geometric Shapes”, Mat. Res. Soc. Symp. Proc., vol. 816, pp. 275-282. Materials Research Society, 2004.
Applied Materials Inc.
Berman Jack I.
Church Shirley L.
Logie Michael J
LandOfFree
Method and apparatus which enable high resolution particle... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and apparatus which enable high resolution particle..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus which enable high resolution particle... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3944903