Method and apparatus to decouple power and cavitation for...

Details Method and apparatus to decouple power and cavitation for... Method and apparatus to decouple power and cavitation for...

2007-01-23

2007-01-23

Kornakov, M. (Department: 1746)

Cleaning and liquid contact with solids

Apparatus

With plural means for supplying or applying different fluids...

C134S184000, C134S200000, C134S902000

Reexamination Certificate

active

10326348

ABSTRACT:
An apparatus and a method is provided for decoupling a cavitation in a liquid from an acoustic energy used to induce the cavitation. Broadly speaking, a pressure adjustment is used to control an acoustically induced cavitation in a liquid contained within a wafer cleaning apparatus, wherein the cavitation is defined by an amount and a size of gas bubbles. An increase in a pressure within the wafer cleaning apparatus results in a suppression of the cavitation. Conversely, a decrease in the pressure within the wafer cleaning apparatus results in an enhancement of the cavitation. Thus, independent control of the cavitation is provided without regard to the acoustic energy or a chemistry of the liquid. Controlling the cavitation allows for a safe and efficient wafer cleaning operation that can be customized to address specific requirements dictated by a particular wafer configuration.

REFERENCES:
patent: 5143103 (1992-09-01), Basso et al.
patent: 5377709 (1995-01-01), Shibano
patent: 2003/0062071 (2003-04-01), Sorbo et al.
patent: 2004/0089324 (2004-05-01), Gray et al.

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